Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology
Speaker: Prof. Shiyuan Liu
School of Mechanical Science and Engineering, Huazhong University of Science and Technology
时间地点：6月26日（周四）上午9:30 四楼报告厅
Abstract: Ellipsometry is an optical technique that uses polarized light to characterize materials, thin films, and surfaces. Among the various types of ellipsometry, Mueller matrix ellipsometry (MME) can obtain up to 16 quantities of a 4 by 4 Mueller matrix, and consequently, MME can acquire much more useful information about the sample. In this talk, I will present the principle and demonstrate the potential of MME for nanostructure metrology. Firstly, I will introduce the basic principle and instrumentation of MME, with a demonstration of the development of a dual rotating-compensator MME in our lab. Then, I will put forward the concept of computational metrology, and point out that MME-based nanometrology is essentially a model-based technique by modeling a complicated forward process followed by solving a corresponding inverse problem. Finally, I will provide several case studies to reveal the capability of MME in nanostructure metrology.
Biography: Shiyuan Liu received his PhD in mechanical engineering from Huazhong University of Science and Technology, Wuhan, China in 1998, and currently is a professor of mechanical engineering at the same university, leading his Nanoscale and Optical Metrology (NOM) Group with research interest in metrology and instrumentation for nanomanufacturing. He also actively works in the area of optical lithography, including partially coherent imaging, optical proximity correction, and inverse mask synthesis. Prof. Liu is a member of SPIE, OSA, AVS, and IEEE, and serves as a reviewer for many international journals such as OSA journals Optics Letters and Optics Express. He holds 32 patents and has authored or co-authored more than 100 technical papers.
报告题目：宽光谱穆勒矩阵椭偏仪开发及其在纳米结构测量中的应用
讲座摘要：椭偏仪是一种测量偏振光状态改变的重要光学仪器，广泛应用于材料光学常数、薄膜厚度及表面特性表征。与传统光谱椭偏仪只能改变波长和入射角2个测量条件并且在每一测量条件下只能获得振幅比和相位差2个测量参数相比，穆勒矩阵椭偏仪可以改变波长、入射角和方位角3个测量条件，而且在每一测量条件下都可以获得一个4´4阶穆勒矩阵共16个参数，因此可以获得更为丰富的测量信息。本报告将阐述穆勒矩阵椭偏仪的基本原理及其在纳米结构测量中的潜在应用。首先介绍穆勒矩阵椭偏仪的原理及其仪器实现，重点介绍本课题组自主开发的基于双旋转补偿器的宽光谱穆勒矩阵椭偏仪。接下来介绍穆勒矩阵椭偏仪在纳米结构测量中的数据分析方法，提出并探讨计算测量的基本概念、基础问题及求解策略。最后给出穆勒矩阵矩阵椭偏仪在纳米结构测量中的若干应用实例，包括30nm电子束光刻样件、具有自然粗糙度形貌的光刻胶样件、存在残胶不均匀性的纳米压印样件等，表明穆勒矩阵椭偏仪特别适合于纳米制造过程的非破坏性、在线、精确测量。
报告人简介：刘世元，男，1970年出生，博士，教授，博士生导师。OSA、AVS、SPIE、IEEE会员，中国微米纳米技术学会理事，中国光学学会光学测试专业委员会委员，中国计量测试学会计量仪器专业委员会委员。现任华中科技大学机械科学与工程学院、数字制造装备与技术国家重点实验室、武汉光电国家实验室（筹）微纳制造研究部教授、博士生导师。近年来主持了包括国家自然科学基金、国家重大科学仪器设备开发专项、国家科技重大专项、国家科技支撑计划、国家863计划等在内的10余项国家级科研项目。组建并带领先进光刻与纳米测量研究组，在微纳测试技术、光学精密仪器、微纳制造技术、步进扫描投影光刻机基础理论与关键技术等方面取得了一批卓有成效的研究成果。获国家发明专利36项，在Appl. Phys. Lett.、Opt. Express、Opt. Lett.等期刊发表SCI学术论文50余篇。